1T/H Dual-Stage RO + EDI Ultra-Pure Water System
High-Efficiency Solution for Industrial & Laboratory Applications
Product Overview
The 1T/H Dual-Stage Reverse Osmosis (RO) + Electrodeionization (EDI) Ultra-Pure Water System is a cutting-edge water purification solution designed to meet stringent industrial and laboratory demands. By integrating advanced RO and EDI technologies, this system delivers ultra-pure water with a resistivity of 15–18.2 MΩ·cm (25°C), eliminating the need for chemical regeneration.
Key Features
- Dual-Stage RO Pre-Treatment
- First-Stage RO: Removes 98%+ dissolved salts, organic matter, and microorganisms.
- Second-Stage RO: Further reduces conductivity to ≤5 μS/cm, ensuring optimal EDI feed water quality.
- EDI Continuous Desalination
- Electrolytic Regeneration: Produces H⁺ and OH⁻ ions to regenerate resin continuously, avoiding acid/alkali chemicals.
- Stable Output: Delivers ultra-pure water with resistivity up to 18.2 MΩ·cm (25°C).
- Modular & Scalable Design
- Flexible Capacity: Single-module output from 10 L/h to 10 m³/h; parallel modules support unlimited scaling.
- Compact Footprint: Reduces installation space by 40% compared to traditional systems.
- Energy-Efficient & Eco-Friendly
- Low Power Consumption: Operates at 150–300 VDC, reducing energy costs by 30%.
- Zero Chemical Waste: Eliminates hazardous acid/alkali disposal, complying with global environmental standards.
- PLC Automation & Remote Monitoring
- Intelligent Control: Real-time monitoring of conductivity, pressure, and flow rate via touchscreen HMI.
- Alarm & Self-Diagnostics: Prevents downtime with automatic alerts for leaks, clogs, or parameter deviations.
Technical Specifications
| Parameter | Specification |
|---|---|
| Feed Water Requirements | RO Permeate: Conductivity ≤20 μS/cm, pH 6–9, TOC <0.5 ppm |
| Output Capacity | 1,000 L/h (24/7 continuous operation) |
| Resistivity Range | 15–18.2 MΩ·cm (25°C) |
| Power Supply | 380V/50Hz, 3-phase (customizable) |
| Material | SUS304/316L stainless steel, PVC/UPVC piping |
| Dimensions (L×W×H) | 2,200 × 1,200 × 1,800 mm (subject to configuration) |
Applications
- Electronics & Semiconductors: Wafer rinsing, photolithography, chemical mechanical polishing (CMP).
- Pharmaceuticals: WFI (Water for Injection), API synthesis, cleanroom utilities.
- Power Generation: Boiler feedwater, turbine cooling, FGD systems.
- Laboratories: HPLC, GC-MS, ICP-OES analysis.
Why Choose Our System?
✅ 24/7 Continuous Operation: No downtime for resin regeneration.
✅ Low O&M Costs: 70% less than traditional ion-exchange systems.
✅ Global Compliance: Meets ISO 13485, FDA, and USP standards.
✅ 10-Year Lifespan: Corrosion-resistant design with 5-year module warranty.
Get a Custom Quote Today!
- Lead Time: 45–60 days (standard models).
- Installation: On-site support available worldwide.
- After-Sales: 24/7 technical hotline + spare parts inventory.
